Using the modern designing and manufacturing systems we are flexible and open to develop and manufacture custom modifications or special custom systems.
TOF-SIMS with access to all features of the FIB unique integration of othogonal TOF-SIMS by Tofwerk company and FIB-SEM by TESCAN
TESCAN EBL Package
Complete solution for ELECTRON BEAM LITHOGRAPHY
TESCAN, the innovative Scanning Electron Microscope manufacturer also offers complete instrument solutions for Electron beam lithography. EBL has long been established as the premier technique for creating structures at the nanoscale as it allows creation of very small structures on the photo resist. This method was developed for manufacturing integrated circuits, spintronics and optoelectronics structures etc. by controling the beam generated inside the SEM column. TESCAN delivers extraordinary lithographic performance on its own high performance SEM, the combination of which ensures first class performance due to full integration with hardware. As typical for all TESCAN products, the TESCAN EBL PACKAGE provides the best price performance ratio when compared to competitors´ solutions.
TESCAN lithographic package includes:
DrawBeam Advanced software tools (a software module which enables the creation and exposure of the nano structures)
DrawBeam Offline licence
Electrostatic Beam Blanker (providing the means to control the beam to produce the required scanning pattern),
LithoBox - Toolbox with basic accessories for electron beam lithography (the user can immediately get started with electron beam lithography),
User manual designed to meet needs of the expert as well as first time or minimal experience users which allows all users to be immediately productive gaining immense advantage from the solutions provided by TESCAN EBL